Quanmin YANG
,
Yongquan LEI+
,
Changpin CHEN
,
Jing WU
,
Qidong WANG
,
Dept. of Mater. Sci. and Eng.
,
Zhejiang Univresity
,
Hangzhou
,
310027
,
China
材料科学技术（英）
The thermal stability of amorphous ternary hydrides Mg_(50)Ni_(50)H_(54) and Mg_(30)Ni_(70)H_(45) and their corre- sponding amorphous binary alloys Mg_(50)Ni_(50) and Mg_(30)Ni_(70) were studied with X-ray diffraction (XRD) and differential scanning calorimetry(DSC). Samples of the amorphous alloys were prepared by mechanical alloying and the amorphous hydrides were obtained by charging the alloys with gas- eous hydrogen at 3.0 MPa and 423 K. It was found that the amorphous hydrides released most of their hydrogen before the crystallization of the essentially hydrogen depleted amorphous alloy. The crystallization temperature of amorphous Mg_(50)Ni_(50)H_(54) elevated and that of amorphous Mg_(30)Ni_(70)H_(45) did not change in relation to the original binary amorphous alloy. This is very excep- tional for amorphous hydrides. The reason for the effects of hydrogen absorption/desorption on the crystallization of amorphous alloys was discussed.
关键词:
amorphous hydride
,
null
,
null
,
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Chenguang GONG+
,
Fuchu SHEN
,
Biguang YE
,
Jian CHEN
,
Zhenjiang University
,
Hangzhou
,
310027
,
China
材料科学技术（英）
This article discusses the silicon lattice damage induced during H-plasma in-situ cleaning and finds that the substrate temperature, plasma power, processing time, all affect the extent of the distortion of the surface and its curability.
关键词:
H-plasma cleaning
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null
,
null
,
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